What is the Impact Factor of Chemical Vapor Deposition?

The journal Chemical Vapor Deposition is indexed in Web of Science (SCIE, quartile Q1) with official metrics continually updated on ImpaQ.

Is Chemical Vapor Deposition indexed in Web of Science or Scopus?

Yes, Chemical Vapor Deposition is indexed in Web of Science (SCIE, Q1 quartile). Furthermore, in Scopus (SCImago), it holds an SJR rating of N/A (Q1) and an H-index of N/A.

Who publishes Chemical Vapor Deposition and what is the Article Processing Charge (APC)?

Chemical Vapor Deposition is published by John Wiley & Sons Ltd.. For exact article processing charges and subscription guidelines, consult the official editorial guidelines.

What is the ISO-4 abbreviation and acronym of Chemical Vapor Deposition?

The official ISO-4 abbreviation of Chemical Vapor Deposition is "Chem. Vap. Deposition". This standardized title abbreviation is used in citation lists conforming to IEEE, APA, Harvard, or Vancouver styles.

WoS SCIE Q1Subscription

Chemical Vapor Deposition

Abbreviation (ISO):Chem. Vap. Deposition

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Identifier (ISSN):0948-1907(Print / Online)

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Publisher:John Wiley & Sons Ltd.

Clarivate JCR Index Advisory: Not Indexed in Latest JCR

Official Website Submission Portal Compare

Clarivate Impact Factor (IF 2024)

N/A

Journal Impact Factor

IF Trend↓

WoS Quartile

WoS SCIEJCR Quartile

Clarivate WoS JCR

WoS Categories↓

Impact Factor Trend (2018–2023)

Clarivate IF trend for Chemical Vapor Deposition

WoS Q1

Annual Impact Factor Metric

Current (2023):0

Scopus SJR & Rank

N/A

SCImago Journal Rank citation prestige weighting

Scopus / Elsevier Data

H-Index (Hirsch Index)

N/A

papers with at least that number of citations each

WoS: SCIE / JCRQ1

Self-Citation RateN/A

Safe Level (< 15%)Warning Level (> 20%)

Self-citation below 15% indicates strong scholarly independence.

Volume & Open AccessSubscription

59articles/year

0% Gold OA•0% Original Research

Aims & Scope

Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.

Topics Covered (Recognized by AI)

Materials science93.3%Chemistry84.9%Nanotechnology75.9%Engineering75.6%Physics72.8%Organic chemistry69.7%Chemical engineering64.9%Quantum mechanics62.7%Biology58.8%Composite material56.5%Geology55.2%Metallurgy49%Optoelectronics41.1%Paleontology39.6%Geomorphology37.1%Thin film37.1%Deposition (geology)36.2%Structural basin36.2%Sediment36.2%Layer (electronics)31.4%Chemical vapor deposition23.7%Environmental chemistry23%Chromatography23%Optics22.9%Computer science22.2%Inorganic chemistry22.1%Analytical Chemistry (journal)22%Biochemistry20.5%Thermodynamics20.3%

Primary Research Areas

Engineering & Technology Materials Science: Coatings & Films

Official Website NLM PubMed Catalog

0 calls

Special Issues

Calls for Papers

No active Calls for Papers found for this journal.

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WoS Categories & Quartiles

Detailed JCR / JCI category rankings and quartile breakdown from Clarivate

Clarivate JCR

No WoS category details available for this journal.

Annual Historical Statistics & Publications

Track annual publication volume, total citations, and Impact Factor evolution

15 year

2023Latest

IF0

Articles / Year—

Total Citations—

2019

IF0

Articles / Year—

Total Citations—

2018

IF2.227

Articles / Year—

Total Citations—

2015

IF—

Articles / Year59

Total Citations801

2014

IF—

Articles / Year62

Total Citations980

Year	Impact Factor	Articles / Year	Total Citations
2023	0	—	—
2019	0	—	—
2018	2.227	—	—
2015	—	59	801
2014	—	62	980
2013	—	68	1,616
2012	—	64	840
2011	—	68	783
2010	—	63	956
2009	—	66	1,410
2008	—	70	1,393
2007	—	136	2,321
2006	—	135	3,350
2005	—	94	1,997
2004	—	72	1,318

SCImago & Scopus Journal Intelligence

Not indexed in SCImago / Scopus database

This journal is currently not indexed in Scopus or is an academic publication indexed exclusively in Web of Science (WoS).

Academic Metric Intelligence

Journal Metrics & Citation Visualizations

Total Cites vs Self-Cites

Evaluation of scholarly independence and citation reach

Total citations steady growth

Self-citation: N/A

Citations per Document

Citation metric windows across 2, 3, and 4 years

Cites / Doc (4 years)Cites / Doc (3 years)Cites / Doc (2 years)

Chinese Academy of Sciences (CAS) Classification

Major / minor zone classification and CAS Early Warning List history

Major Category (Broad Field):

Updating

Minor Category (Specific Field):

Updating

CAS Early Warning List History:

Updated annually: 2020 – 2024

2020

Not warned

2021

Not warned

2022

Not warned

2023

Not warned

2024

Not warned

Academic Intelligence Overview & Context

ImpaQ Analysis

Chemical Vapor Deposition (abbr: Chem. Vap. Deposition, ISSN: 0948-1907) is a peer-reviewed international scholarly journal in the field of Engineering & Technology, published by John Wiley & Sons Ltd. in Germany. The periodical holds tracked under Web of Science (SCIE) in quartile Q1.

The journal enforces rigorous peer evaluation with a publication frequency of Bimonthly, an annual output of approximately 59 scientific articles. In terms of accessibility and author fees, it operates under the Subscription model with APC fees are not specified. It serves as a benchmark publication platform for academics, researchers, and doctoral candidates seeking global research visibility.