ImpaQ Ecosystem•Clarivate, Scopus & CORE Data
Clarivate WoS 2024 / 2025 Data
IMPAQ
WoS SCIE Q2Scopus Q1SCImago #4,259Hybrid

IEEE Electron Device Letters

Acronym:edl
•
Abbreviation (ISO):IEEE ELECTRON DEVICE LETT
•
Identifier (ISSN):0741-3106(Print)
•
Publisher:Institute of Electrical and Electronics Engineers Inc.
Clarivate IF (2026)
4.6↑ +0.1
Journal Impact Factor
IF Trend↓
WoS Quartile
Q2
WoS SCIEJCR Quartile
Clarivate WoS JCR
WoS Categories↓
JCR Release Date: 2026-06-17

Impact Factor Trend (2018–2026)

Clarivate IF trend for IEEE Electron Device Letters

WoS Q2
24573.4320183.7520194.2220204.1920214.8220224.920234.120244.520254.62026
Annual Impact Factor Metric
Current (2026):4.6
Scopus SJR & RankScopus Q1
1.087
#4,259

SCImago Journal Rank citation prestige weighting

Scopus Year: 2025
H-Index (2025)
184

184 papers with at least that number of citations each

WoS: SCIE / JCRQ2
Self-Citation Rate9.8%
Safe Level (< 15%)Warning Level (> 20%)
Self-citation below 15% indicates strong scholarly independence.
Volume & Open AccessHybrid
429articles/year
2.21% Gold OA•100% Original Research

Aims & Scope

IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.

Topics Covered (Recognized by AI)
Engineering93.7%Physics92%Materials science90%Electrical engineering89.7%Quantum mechanics85.3%Optoelectronics85.1%Chemistry63.4%Computer science59.4%Voltage58.8%Organic chemistry56.4%Transistor47.2%Composite material45.8%Nanotechnology43.9%Electronic engineering39.9%Condensed matter physics35%Metallurgy34.6%Layer (electronics)33.5%Optics27.8%Thermodynamics26.3%Physical chemistry26%Telecommunications23.3%Mathematics22.8%Electrode22.6%Silicon20.8%

WoS Categories & Quartiles

Detailed JCR / JCI category rankings and quartile breakdown from Clarivate

Clarivate JCR & JCI
JCRSCIE2026

ENGINEERING, ELECTRICAL & ELECTRONIC

Q2
Rank108/369
IndexSCIE
JCISCIE2026

ENGINEERING, ELECTRICAL & ELECTRONIC

Q2
Rank97/371
IndexSCIE

Annual Historical Statistics & Publications

Track annual publication volume, total citations, and Impact Factor evolution

12 year
2026Latest
IF4.6
Articles / Year484
Total Citations108
2025
IF4.5
Articles / Year701
Total Citations1,929
2024
IF4.1
Articles / Year729
Total Citations5,098
2023
IF4.9
Articles / Year594
Total Citations7,329
2022
IF4.816
Articles / Year653
Total Citations10,473

SCImago & Scopus Journal Intelligence

Global SCImago ranking, SJR prestige index, Scopus coverage, and societal policy impact

Rank #4,259Scopus Q1SCImago Profile
Scopus Coverage:1980-2026
Scopus Broad Areas:EngineeringMaterials Science
Scopus Citation Rank (SJR)Q1
1.087

Weighted prestige citation metric per document indexed in the Scopus database.

Quartile: Scopus Q1
Citations / Doc (2 years)
4.65

Average citations received per document published in the 2-year window.

2-Year Citation Window
Estimated Publication Fee (APC)
$3,436 USD

Estimated Article Processing Charge for Open Access publication.

Estimated cost / article

Scopus 3-Year Publication & Citation Window

3-Year Citations7,605
3-Year Documents1,599
Citable Documents1,591

Aggregated from Scopus database across the 3-year SJR evaluation window.

Societal Impact & Inclusivity (SCImago)

Policy Citations (Overton)0

Citations in government and international policy documents

Female Author Rate27.9%

Percentage of female authors published in the journal

Real-world societal policy reach and author gender diversity tracked by SCImago.

Scopus Subject Categories

Electrical and Electronic EngineeringQ1
Electronic, Optical and Magnetic MaterialsQ1
Academic Metric Intelligence

Journal Metrics & Citation Visualizations

Total Cites vs Self-Cites

Evaluation of scholarly independence and citation reach

Total citations steady growth
Self-citation: 9.8%

Citations per Document

Citation metric windows across 2, 3, and 4 years

Cites / Doc (4 years)Cites / Doc (3 years)Cites / Doc (2 years)

Chinese Academy of Sciences (CAS) Classification

Major / minor zone classification and CAS Early Warning List history

Major Category (Broad Field):
2区 (Zone 2)Engineering & Technology
Minor Category (Specific Field):
3区ENGINEERING, ELECTRICAL & ELECTRONIC
CAS Early Warning List History:
Updated annually: 2020 – 2024
2020
Not warned
2021
Not warned
2022
Not warned
2023
Not warned
2024
Not warned

Academic Intelligence Overview & Context

ImpaQ Analysis

IEEE Electron Device Letters (acronym: edl, abbr: IEEE ELECTRON DEVICE LETT, ISSN: 0741-3106) is a peer-reviewed international scholarly journal in the field of Engineering & Technology, published by Institute of Electrical and Electronics Engineers Inc. in United States since 1980. The periodical holds a Journal Impact Factor (JIF) of 4.60, ranking in quartile Q2 of Web of Science (SCIE), a Scopus SJR indicator of 1.087 (Q1), an H-index of 184.

The journal enforces rigorous peer evaluation with a publication frequency of Monthly, an annual output of approximately 429 scientific articles. In terms of accessibility and author fees, it operates under the Hybrid model with an estimated APC of $3,436 USD. It serves as a benchmark publication platform for academics, researchers, and doctoral candidates seeking global research visibility.

Publishing & Editorial Information

Detailed publisher, peer-review turnaround, and publication cycle specifications

Open Access Model
Hybrid
Publisher
Institute of Electrical and Electronics Engineers Inc.
Publication Language
English
Frequency
Monthly
Founding Year
1980
Indexing & Databases
SCIEScopusPubMed
Editorial Address
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 445 HOES LANE, PISCATAWAY, USA, NJ, 08855-4141

Similar Journals in Discipline

Journals in the same research field with comparable impact metrics

Record UUID: f055eb48-ae34-49e0-96fe-c39a68ea2b4c
Database Updated: 2026-10-01