What is the Impact Factor of Journal of Vacuum Science & Technology B?

According to the latest Clarivate Journal Citation Reports (JCR), the Journal Impact Factor of Journal of Vacuum Science & Technology B is 1.60, ranking in quartile Q4 of Web of Science (SCIE).

Is Journal of Vacuum Science & Technology B indexed in Web of Science or Scopus?

Yes, Journal of Vacuum Science & Technology B is indexed in Web of Science (SCIE, Q4 quartile). Furthermore, in Scopus (SCImago), it holds an SJR rating of N/A (Q4) and an H-index of N/A.

Who publishes Journal of Vacuum Science & Technology B and what is the Article Processing Charge (APC)?

Journal of Vacuum Science & Technology B is published by A V S AMER INST PHYSICS. For exact article processing charges and subscription guidelines, consult the official editorial guidelines.

What is the ISO-4 abbreviation and acronym of Journal of Vacuum Science & Technology B?

The official ISO-4 abbreviation of Journal of Vacuum Science & Technology B is "J VAC SCI TECHNOL B". This standardized title abbreviation is used in citation lists conforming to IEEE, APA, Harvard, or Vancouver styles.

WoS SCIE Q4Hybrid

Journal of Vacuum Science & Technology B

Abbreviation (ISO):J VAC SCI TECHNOL B

•

Identifier (ISSN):1071-1023(Print)

•

Publisher:A V S AMER INST PHYSICS

Official Website Submission Portal Compare

Clarivate IF (2026)

1.6↑ +0.4

Journal Impact Factor

IF Trend↓

WoS Quartile

WoS SCIEJCR Quartile

Clarivate WoS JCR

WoS Categories↓

JCR Release Date: 2026-06-17

Impact Factor Trend (2020–2026)

Clarivate IF trend for Journal of Vacuum Science & Technology B

WoS Q4

Annual Impact Factor Metric

Current (2026):1.6

Scopus SJR & Rank

N/A

SCImago Journal Rank citation prestige weighting

Scopus / Elsevier Data

H-Index (Hirsch Index)

N/A

papers with at least that number of citations each

WoS: SCIE / JCRQ4

Self-Citation Rate13.3%

Safe Level (< 15%)Warning Level (> 20%)

Self-citation below 15% indicates strong scholarly independence.

Volume & Open AccessHybrid

149articles/year

9.78% Gold OA•99.35% Original Research

Aims & Scope

Journal of Vacuum Science & Technology B emphasizes processing, measurement and phenomena associated with micrometer and nanometer structures and devices. Processing may include vacuum processing, plasma processing and microlithography among others, while measurement refers to a wide range of materials and device characterization methods for understanding the physics and chemistry of submicron and nanometer structures and devices.

Topics Covered (Recognized by AI)

Physics98.5%Materials science98.5%Quantum mechanics91.4%Chemistry89.2%Nanotechnology84.2%Organic chemistry83.6%Composite material80.4%Optoelectronics80.4%Engineering79.6%Optics63.8%Layer (electronics)54.1%Metallurgy46.5%Electrical engineering46.1%Chemical engineering34.5%Medicine32.5%Nuclear physics32.5%Biology32.4%Computer science32.1%Thermodynamics30.8%Pathology30%Alternative medicine27%Fabrication26.9%Geology25.5%Condensed matter physics25%Chromatography24.7%Physical chemistry23.7%Analytical Chemistry (journal)22.9%Environmental chemistry22.9%Mathematics21.8%Electron20.9%

Primary Research Areas

Engineering & Technology Engineering: Electrical & Electronic

Official Website NLM PubMed Catalog Submission Portal

0 calls

Special Issues

Calls for Papers

No active Calls for Papers found for this journal.

Expand

WoS Categories & Quartiles

Detailed JCR / JCI category rankings and quartile breakdown from Clarivate

Clarivate JCR & JCI

JCRSCIE2026

ENGINEERING, ELECTRICAL & ELECTRONIC

Rank280/369

IndexSCIE

JCRSCIE2026

NANOSCIENCE & NANOTECHNOLOGY

Rank128/148

IndexSCIE

JCRSCIE2026

PHYSICS, APPLIED

Rank148/191

IndexSCIE

JCISCIE2026

ENGINEERING, ELECTRICAL & ELECTRONIC

Rank299/371

IndexSCIE

JCISCIE2026

NANOSCIENCE & NANOTECHNOLOGY

Rank125/148

IndexSCIE

JCISCIE2026

PHYSICS, APPLIED

Rank154/191

IndexSCIE

Category	Index	Rank	Quartile
ENGINEERING, ELECTRICAL & ELECTRONIC	JCRSCIE	280/369	Q4
NANOSCIENCE & NANOTECHNOLOGY	JCRSCIE	128/148	Q4
PHYSICS, APPLIED	JCRSCIE	148/191	Q4
ENGINEERING, ELECTRICAL & ELECTRONIC	JCISCIE	299/371	Q4
NANOSCIENCE & NANOTECHNOLOGY	JCISCIE	125/148	Q4
PHYSICS, APPLIED	JCISCIE	154/191	Q4

Annual Historical Statistics & Publications

Track annual publication volume, total citations, and Impact Factor evolution

18 year

2026Latest

IF1.6

Articles / Year—

Total Citations—

2025

IF1.2

Articles / Year—

Total Citations—

2023

IF1.4

Articles / Year—

Total Citations—

2022

IF1.572

Articles / Year—

Total Citations—

2021

IF1.416

Articles / Year—

Total Citations—

Year	Impact Factor	Articles / Year	Total Citations
2026	1.6	—	—
2025	1.2	—	—
2023	1.4	—	—
2022	1.572	—	—
2021	1.416	—	—
2020	1.511	—	—
2015	—	3	1
2014	—	1	0
2012	—	1	8
2011	—	2	1
2010	—	2	1
2009	—	639	8,683
2008	—	481	9,138
2007	—	490	9,533
2006	—	611	10,467
2005	—	572	9,951
2004	—	677	13,203
2003	—	559	12,835

SCImago & Scopus Journal Intelligence

Not indexed in SCImago / Scopus database

This journal is currently not indexed in Scopus or is an academic publication indexed exclusively in Web of Science (WoS).

Academic Metric Intelligence

Journal Metrics & Citation Visualizations

Total Cites vs Self-Cites

Evaluation of scholarly independence and citation reach

Total citations steady growth

Self-citation: 13.3%

Citations per Document

Citation metric windows across 2, 3, and 4 years

Cites / Doc (4 years)Cites / Doc (3 years)Cites / Doc (2 years)

Chinese Academy of Sciences (CAS) Classification

Major / minor zone classification and CAS Early Warning List history

Major Category (Broad Field):

4区 (Zone 4)Engineering & Technology

Minor Category (Specific Field):

4区ENGINEERING, ELECTRICAL & ELECTRONIC

CAS Early Warning List History:

Updated annually: 2020 – 2024

2020

Not warned

2021

Not warned

2022

Not warned

2023

Not warned

2024

Not warned

Academic Intelligence Overview & Context

ImpaQ Analysis

Journal of Vacuum Science & Technology B (abbr: J VAC SCI TECHNOL B, ISSN: 1071-1023) is a peer-reviewed international scholarly journal in the field of Engineering & Technology, published by A V S AMER INST PHYSICS in United States since 1991. The periodical holds a Journal Impact Factor (JIF) of 1.60, ranking in quartile Q4 of Web of Science (SCIE).

The journal enforces rigorous peer evaluation with a publication frequency of Bimonthly, an annual output of approximately 149 scientific articles. In terms of accessibility and author fees, it operates under the Hybrid model with APC fees are not specified. It serves as a benchmark publication platform for academics, researchers, and doctoral candidates seeking global research visibility.