ImpaQ Ecosystem•Clarivate, Scopus & CORE Data
Clarivate WoS 2024 / 2025 Data
IMPAQ
WoS SCIE Q1Scopus Q1SCImago #7,328Hybrid

Materials Science in Semiconductor Processing

Acronym:mssp
•
Abbreviation (ISO):MATER. SCI. SEMICOND. PROCESS
•
Identifier (ISSN):1369-8001(Print)
•
Publisher:Elsevier Ltd
Clarivate IF (2026)
5.2↑ +0.6
Journal Impact Factor
IF Trend↓
WoS Quartile
Q1
WoS SCIEJCR Quartile
Clarivate WoS JCR
WoS Categories↓
JCR Release Date: 2026-06-17

Impact Factor Trend (2018–2026)

Clarivate IF trend for Materials Science in Semiconductor Processing

WoS Q1
13572.5920182.7220193.0820203.9320214.6420224.120234.220244.620255.22026
Annual Impact Factor Metric
Current (2026):5.2
Scopus SJR & RankScopus Q1
0.767
#7,328

SCImago Journal Rank citation prestige weighting

Scopus Year: 2025
H-Index (2025)
105

105 papers with at least that number of citations each

WoS: SCIE / JCRQ1
Self-Citation Rate4.8%
Safe Level (< 15%)Warning Level (> 20%)
Self-citation below 15% indicates strong scholarly independence.
Volume & Open AccessHybrid
873articles/year
10.45% Gold OA•97.45% Original Research

Aims & Scope

Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.

Topics Covered (Recognized by AI)
Materials SciencePhysicsQuantum MechanicsChemistryEngineeringOrganic ChemistryOptoelectronicsNanotechnologyComposite MaterialsMetallurgyChemical EngineeringOpticsElectrical EngineeringCondensed Matter PhysicsBiologyThermodynamicsChromatographyEnvironmental ChemistryCrystallographyPhysical ChemistryGeologyComputer ScienceBiochemistry

WoS Categories & Quartiles

Detailed JCR / JCI category rankings and quartile breakdown from Clarivate

Clarivate JCR & JCI
JCRSCIE2026

ENGINEERING, ELECTRICAL & ELECTRONIC

Q1
Rank85/369
IndexSCIE
JCRSCIE2026

MATERIALS SCIENCE, MULTIDISCIPLINARY

Q2
Rank165/472
IndexSCIE
JCRSCIE2026

PHYSICS, APPLIED

Q1
Rank46/191
IndexSCIE
JCRSCIE2026

PHYSICS, CONDENSED MATTER

Q2
Rank24/81
IndexSCIE
JCISCIE2026

ENGINEERING, ELECTRICAL & ELECTRONIC

Q2
Rank123/371
IndexSCIE
JCISCIE2026

MATERIALS SCIENCE, MULTIDISCIPLINARY

Q2
Rank143/473
IndexSCIE
JCISCIE2026

PHYSICS, APPLIED

Q2
Rank51/191
IndexSCIE
JCISCIE2026

PHYSICS, CONDENSED MATTER

Q1
Rank19/81
IndexSCIE

Annual Historical Statistics & Publications

Track annual publication volume, total citations, and Impact Factor evolution

12 year
2026Latest
IF5.2
Articles / Year715
Total Citations390
2025
IF4.6
Articles / Year1,016
Total Citations4,366
2024
IF4.2
Articles / Year1,034
Total Citations12,022
2023
IF4.1
Articles / Year677
Total Citations9,346
2022
IF4.644
Articles / Year726
Total Citations13,007

SCImago & Scopus Journal Intelligence

Global SCImago ranking, SJR prestige index, Scopus coverage, and societal policy impact

Rank #7,328Scopus Q1SCImago Profile
Scopus Coverage:1998-2026
Scopus Broad Areas:EngineeringMaterials SciencePhysics and Astronomy
Scopus Citation Rank (SJR)Q1
0.767

Weighted prestige citation metric per document indexed in the Scopus database.

Quartile: Scopus Q1
Citations / Doc (2 years)
5.41

Average citations received per document published in the 2-year window.

2-Year Citation Window
Estimated Publication Fee (APC)
$3,143 USD

Estimated Article Processing Charge for Open Access publication.

Estimated cost / article

Scopus 3-Year Publication & Citation Window

3-Year Citations11,548
3-Year Documents2,225
Citable Documents2,215

Aggregated from Scopus database across the 3-year SJR evaluation window.

Societal Impact & Inclusivity (SCImago)

Policy Citations (Overton)0

Citations in government and international policy documents

Female Author Rate30.9%

Percentage of female authors published in the journal

Real-world societal policy reach and author gender diversity tracked by SCImago.

Scopus Subject Categories

Condensed Matter PhysicsQ1
Mechanical EngineeringQ1
Mechanics of MaterialsQ1
Materials Science (miscellaneous)Q2
Academic Metric Intelligence

Journal Metrics & Citation Visualizations

Total Cites vs Self-Cites

Evaluation of scholarly independence and citation reach

Total citations steady growth
Self-citation: 4.8%

Citations per Document

Citation metric windows across 2, 3, and 4 years

Cites / Doc (4 years)Cites / Doc (3 years)Cites / Doc (2 years)

Chinese Academy of Sciences (CAS) Classification

Major / minor zone classification and CAS Early Warning List history

Major Category (Broad Field):
3区 (Zone 3)Materials Science
Minor Category (Specific Field):
3区ENGINEERING, ELECTRICAL & ELECTRONIC
CAS Early Warning List History:
Updated annually: 2020 – 2024
2020
Not warned
2021
Not warned
2022
Not warned
2023
Not warned
2024
Not warned

Academic Intelligence Overview & Context

ImpaQ Analysis

Materials Science in Semiconductor Processing (acronym: mssp, abbr: MATER. SCI. SEMICOND. PROCESS, ISSN: 1369-8001) is a peer-reviewed international scholarly journal in the field of Engineering & Technology, published by Elsevier Ltd in England. The periodical holds a Journal Impact Factor (JIF) of 5.20, ranking in quartile Q1 of Web of Science (SCIE), a Scopus SJR indicator of 0.767 (Q1), an H-index of 105.

The journal enforces rigorous peer evaluation with an average review speed of 3.7周, a publication frequency of Bimonthly, an annual output of approximately 873 scientific articles. In terms of accessibility and author fees, it operates under the Hybrid model with an estimated APC of $3,143 USD. It serves as a benchmark publication platform for academics, researchers, and doctoral candidates seeking global research visibility.

Publishing & Editorial Information

Detailed publisher, peer-review turnaround, and publication cycle specifications

Open Access Model
Hybrid
Publisher
Elsevier Ltd
Publication Language
English
Frequency
Bimonthly
Indexing & Databases
SCIEScopusPubMed
Editorial Address
ELSEVIER SCI LTD, THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD, ENGLAND, OXON, OX5 1GB

Similar Journals in Discipline

Journals in the same research field with comparable impact metrics

Record UUID: 3f1181c9-55f9-4490-a27e-b3b6ba0e6789
Database Updated: 2026-10-16