Plasma Chemistry and Plasma Processing
Impact Factor Trend (2018–2026)
Clarivate IF trend for Plasma Chemistry and Plasma Processing
SCImago Journal Rank citation prestige weighting
89 papers with at least that number of citations each
Aims & Scope
Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
Special Issues
Calls for PapersNo active Calls for Papers found for this journal.
WoS Categories & Quartiles
Detailed JCR / JCI category rankings and quartile breakdown from Clarivate
ENGINEERING, CHEMICAL
PHYSICS, APPLIED
PHYSICS, FLUIDS & PLASMAS
ENGINEERING, CHEMICAL
PHYSICS, APPLIED
PHYSICS, FLUIDS & PLASMAS
Annual Historical Statistics & Publications
Track annual publication volume, total citations, and Impact Factor evolution
SCImago & Scopus Journal Intelligence
Global SCImago ranking, SJR prestige index, Scopus coverage, and societal policy impact
Weighted prestige citation metric per document indexed in the Scopus database.
Average citations received per document published in the 2-year window.
Estimated Article Processing Charge for Open Access publication.
Scopus 3-Year Publication & Citation Window
Aggregated from Scopus database across the 3-year SJR evaluation window.
Societal Impact & Inclusivity (SCImago)
Citations in government and international policy documents
Percentage of female authors published in the journal
Real-world societal policy reach and author gender diversity tracked by SCImago.
Scopus Subject Categories
Journal Metrics & Citation Visualizations
Total Cites vs Self-Cites
Evaluation of scholarly independence and citation reach
Citations per Document
Citation metric windows across 2, 3, and 4 years
Chinese Academy of Sciences (CAS) Classification
Major / minor zone classification and CAS Early Warning List history
Academic Intelligence Overview & Context
ImpaQ AnalysisPlasma Chemistry and Plasma Processing (acronym: pcpp, abbr: PLASMA CHEM. PLASMA PROCESS, ISSN: 0272-4324) is a peer-reviewed international scholarly journal in the field of Engineering & Technology, published by Springer US in United States since 1981. The periodical holds a Journal Impact Factor (JIF) of 3.50, ranking in quartile Q2 of Web of Science (SCIE), a Scopus SJR indicator of 0.585 (Q2), an H-index of 89.
The journal enforces rigorous peer evaluation with a publication frequency of Quarterly, an annual output of approximately 74 scientific articles. In terms of accessibility and author fees, it operates under the Hybrid model with an estimated APC of $2,962 USD. It serves as a benchmark publication platform for academics, researchers, and doctoral candidates seeking global research visibility.
Publishing & Editorial Information
Detailed publisher, peer-review turnaround, and publication cycle specifications
Similar Journals in Discipline
Journals in the same research field with comparable impact metrics