ImpaQ Ecosystem•Clarivate, Scopus & CORE Data
Clarivate WoS 2024 / 2025 Data
IMPAQ
WoS SCIE Q3Scopus Q2SCImago #10,304Hybrid

IEEE Transactions on Semiconductor Manufacturing

Acronym:tsm-ieee
•
Abbreviation (ISO):IEEE TRANS. SEMICOND. MANUF
•
Identifier (ISSN):0894-6507(Print)/1558-2345(Online)
•
Publisher:Institute of Electrical and Electronics Engineers Inc.
Clarivate IF (2026)
2.5↑ +0.2
Journal Impact Factor
IF Trend↓
WoS Quartile
Q3
WoS SCIEJCR Quartile
Clarivate WoS JCR
WoS Categories↓
JCR Release Date: 2026-06-17

Impact Factor Trend (2018–2026)

Clarivate IF trend for IEEE Transactions on Semiconductor Manufacturing

WoS Q3
01341.3420181.1420191.9820202.8720212.820222.720232.320242.320252.52026
Annual Impact Factor Metric
Current (2026):2.5
Scopus SJR & RankScopus Q2
0.575
#10,304

SCImago Journal Rank citation prestige weighting

Scopus Year: 2025
H-Index (2025)
87

87 papers with at least that number of citations each

WoS: SCIE / JCRQ3
Self-Citation Rate13%
Safe Level (< 15%)Warning Level (> 20%)
Self-citation below 15% indicates strong scholarly independence.
Volume & Open AccessHybrid
63articles/year
4.51% Gold OA•100% Original Research

Aims & Scope

The IEEE Transactions on Semiconductor Manufacturing addresses the challenging problems of manufacturing complex microelectronic components, especially very large scale integrated circuits (VLSI). Manufacturing these products requires precision micropatterning, precise control of materials properties, ultraclean work environments, and complex interactions of chemical, physical, electrical and mechanical processes.

Topics Covered (Recognized by AI)
Engineering94.4%Computer science82.8%Physics81.8%Materials science78.1%Electrical engineering70%Optoelectronics67.3%Nanotechnology60.7%Quantum mechanics52.1%Chemistry41.6%Wafer41.5%Operating system40.3%Mathematics38.9%Composite material36.6%Organic chemistry36.1%Electronic engineering35.2%Programming language33.1%Metallurgy25.7%Thermodynamics24.1%Biology22.9%Optics22.8%Layer (electronics)22.7%Artificial intelligence22.5%Semiconductor device fabrication22.4%Process (computing)22.1%Reliability engineering20.3%

WoS Categories & Quartiles

Detailed JCR / JCI category rankings and quartile breakdown from Clarivate

Clarivate JCR & JCI
JCRSCIE2026

ENGINEERING, ELECTRICAL & ELECTRONIC

Q3
Rank204/369
IndexSCIE
JCRSCIE2026

ENGINEERING, MANUFACTURING

Q3
Rank53/71
IndexSCIE
JCRSCIE2026

PHYSICS, APPLIED

Q3
Rank114/191
IndexSCIE
JCRSCIE2026

PHYSICS, CONDENSED MATTER

Q3
Rank45/81
IndexSCIE
JCISCIE2026

ENGINEERING, ELECTRICAL & ELECTRONIC

Q3
Rank218/371
IndexSCIE
JCISCIE2026

ENGINEERING, MANUFACTURING

Q3
Rank50/71
IndexSCIE
JCISCIE2026

PHYSICS, APPLIED

Q3
Rank114/191
IndexSCIE
JCISCIE2026

PHYSICS, CONDENSED MATTER

Q2
Rank36/81
IndexSCIE

Annual Historical Statistics & Publications

Track annual publication volume, total citations, and Impact Factor evolution

12 year
2026Latest
IF2.5
Articles / Year85
Total Citations112
2025
IF2.3
Articles / Year143
Total Citations200
2024
IF2.3
Articles / Year100
Total Citations319
2023
IF2.7
Articles / Year105
Total Citations607
2022
IF2.796
Articles / Year109
Total Citations1,020

SCImago & Scopus Journal Intelligence

Global SCImago ranking, SJR prestige index, Scopus coverage, and societal policy impact

Rank #10,304Scopus Q2SCImago Profile
Scopus Coverage:1988-2026
Scopus Broad Areas:EngineeringMaterials SciencePhysics and Astronomy
Scopus Citation Rank (SJR)Q2
0.575

Weighted prestige citation metric per document indexed in the Scopus database.

Quartile: Scopus Q2
Citations / Doc (2 years)
2.75

Average citations received per document published in the 2-year window.

2-Year Citation Window
Estimated Publication Fee (APC)
$3,286 USD

Estimated Article Processing Charge for Open Access publication.

Estimated cost / article

Scopus 3-Year Publication & Citation Window

3-Year Citations690
3-Year Documents236
Citable Documents224

Aggregated from Scopus database across the 3-year SJR evaluation window.

Societal Impact & Inclusivity (SCImago)

Policy Citations (Overton)0

Citations in government and international policy documents

Female Author Rate21.9%

Percentage of female authors published in the journal

Real-world societal policy reach and author gender diversity tracked by SCImago.

Scopus Subject Categories

Condensed Matter PhysicsQ2
Electrical and Electronic EngineeringQ2
Electronic, Optical and Magnetic MaterialsQ2
Industrial and Manufacturing EngineeringQ2
Academic Metric Intelligence

Journal Metrics & Citation Visualizations

Total Cites vs Self-Cites

Evaluation of scholarly independence and citation reach

Total citations steady growth
Self-citation: 13%

Citations per Document

Citation metric windows across 2, 3, and 4 years

Cites / Doc (4 years)Cites / Doc (3 years)Cites / Doc (2 years)

Chinese Academy of Sciences (CAS) Classification

Major / minor zone classification and CAS Early Warning List history

Major Category (Broad Field):
3区 (Zone 3)Engineering & Technology
Minor Category (Specific Field):
4区ENGINEERING, MANUFACTURING
CAS Early Warning List History:
Updated annually: 2020 – 2024
2020
Not warned
2021
Not warned
2022
Not warned
2023
Not warned
2024
Not warned

Academic Intelligence Overview & Context

ImpaQ Analysis

IEEE Transactions on Semiconductor Manufacturing (acronym: tsm-ieee, abbr: IEEE TRANS. SEMICOND. MANUF, ISSN: 0894-6507) is a peer-reviewed international scholarly journal in the field of Engineering & Technology, published by Institute of Electrical and Electronics Engineers Inc. in United States. The periodical holds a Journal Impact Factor (JIF) of 2.50, ranking in quartile Q3 of Web of Science (SCIE), a Scopus SJR indicator of 0.575 (Q2), an H-index of 87.

The journal enforces rigorous peer evaluation with a publication frequency of Quarterly, an annual output of approximately 63 scientific articles. In terms of accessibility and author fees, it operates under the Hybrid model with an estimated APC of $3,286 USD. It serves as a benchmark publication platform for academics, researchers, and doctoral candidates seeking global research visibility.

Publishing & Editorial Information

Detailed publisher, peer-review turnaround, and publication cycle specifications

Open Access Model
Hybrid
Publisher
Institute of Electrical and Electronics Engineers Inc.
Publication Language
English
Frequency
Quarterly
Indexing & Databases
SCIEScopusPubMed
Editorial Address
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 445 HOES LANE, PISCATAWAY, USA, NJ, 08855-4141

Similar Journals in Discipline

Journals in the same research field with comparable impact metrics

Record UUID: d1a376b6-18d5-4cc1-b6b2-d782460c7044
Database Updated: 2026-10-01